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National IC Industry Fund Phase III Registered at RMB 344 Billion, Targeting Equipment and Materials
China’s National Integrated Ci…
8-Inch GaN-on-Silicon Production Speeds Up as Power Devices Target AI Data Center Power
Driven by AI data center power…
Core Components of Cleaning Equipment Go Domestic: Valves, Pumps, MFCs and Temperature Controllers
The performance of wafer clean…
Domestic Single-Wafer Cleaning Accelerates as ACM Research Reaches About 8% Global Share
ACM Research has lifted its gl…
Third-Generation Semiconductor Expansion Reshapes Supply as 8-Inch SiC Substrates Enter Mass Delivery
Chinese SiC substrate makers a…
Global Wafer Cleaning Equipment Market Set for ~$6.9 Billion in 2026 as the Single-Wafer Shift Reshapes a Three-Way Race
The global wafer cleaning equi…
AI Demand Ignites an HBM Capacity Build-Out as the Big Three Memory Makers Race to Add Capacity
Exploding demand for AI comput…
Wafer Particle and Defect Inspection Heats Up as Optical and E-Beam Routes Support Yield
Wafer particle and defect insp…
TSMC’s 2-Nanometer Process Enters Mass Production, Accelerating Global Wafer Expansion
TSMC has moved its 2-nanometer…
Lithography Localization Steady as 28nm Immersion DUV Enters Batch Delivery
Chinese 28nm immersion DUV lit…
EFEM Front-End Modules: The Clean Automation Hub Linked to Cleaning and Spin-Dry Stations
The EFEM (Equipment Front End …
The Evolution of Wafer Spin Dryers: High RPM, Hot Nitrogen Sweep and Anti-Static Design Working as One
Wafer spin dryers have evolved…
